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Axcelis Technologies, a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced that it has received follow on orders for the Purion XE platform high energy implanter from multiple foundries in the Asia Pacific Region. The systems will be used to support capacity expansions for the production of specialty devices for IoT and image sensor markets. The systems are scheduled to ship in the second quarter.

Executive Vice President, Customer Operations John Aldeborgh, said, “We are very excited about this opportunity to expand our market share with these leading foundries.  As demand for specialty devices continues to grow, we see significant opportunity for the Purion XE . The systems broad energy range, high beam currents and low levels of contamination provide industry leading productivity, manufacturing flexibility and device yields, making it the system of choice for the foundry environment.”

The Company recently introduced several high energy product line extensions, including the Purion EXE and VXE, to provide customers with the capability to perform ultra-high energy implants. The applications for these implants continue to expand in the specialty device market. All systems are available in both 200 and 300mm configurations.

The Purion Platform

The Purion redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers’ device performance and yield. On this platform, Axcelis has built the industry’s first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability. This cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis’ industry leading Purion Contamination Shield Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance. The platform’s proprietary Purion Vector dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available. The Purion’s superior beam current performance combined with the Purion 500wph end station provides the industry’s highest productivity. The Purion includes the Purion M medium current implanter, the Purion H high current implanter, and the Purion XE high energy implanter.

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